三、代表性科研成果: (1) Lu, Z., Zhan, T., Sun, Y., Min, S., Gui, Y., Chen, L., & Xu, B.. Single-Sheet Multilayer µPADs fabricated by Hand-Tearing and PDMS Stamping. Sensors and Actuators B: Chemical, 2025.138318.(通讯) (2) Dai, W., Sun, Y., Qian, J., Yin, X., Chen, L., Chen, F., & Liu, S. (2024). Localizing bismuth single atoms around tin nanoparticles for efficient CO2 reduction and fabrication of high-performance sodium-ion batteries. Journal of Alloys and Compounds,2024,985, 174007. (通讯) (3) Chen, L., Lu, Z., Fu, C., Bi, Z., Que, M., Sun, J., & Sun, Y.” A comparative study on the degradation behaviors of ferroelectric gate GaN HEMT with PZT and PZT/Al2O3 gate stacks.” Micromachines, 2024.15(1), 101. (4) L. Chen, M. Ma, J. Cao, J. Sun, M. Que, and Y. Sun. “Impact of oxygen in electrical properties and hot-carrier stress-induced degradation of GaN high electron mobility transistors”, Chinese Physics B, 2021, 30(10): 108502 (5) L. Chen, H. Wang, B. Hou, M. Liu, L. Shen, X. Lu, X. Ma, and Y. Hao. “Hetero-integration of Quasi Two Dimensional PbZr0.2Ti0.8O3 and GaN/AlGaN HEMT and Non-volatile Modulation of 2DEG.” Applied Physics Letters, 2019, 115(19):193505. (6) L. Chen, X. Ma, J. Zhu, B. Hou, F. Song, Q. Zhu, M. Zhang, L. Yang, and Y. Hao. “Polarization Engineering in PZT/AlGaN/GaN High-Electron-Mobility Transistors.” IEEE Transactions on Electron Devices, 2018, 65(8): 3149-3155. (7) L. Chen, X. Ma, J. Zhu, B. Hou, Q. Zhu, M. Zhang, L. Yang, J. Yin, J. Wu, and Y. Hao. “Direct Observation of Gate Leakage Paths in AlGaN/GaN High Electron Mobility Transistors by Electron Beam-Induced Current.” IEEE Transactions on Device and Materials Reliability, 2018, 18(3): 259-363. (8) L. Chen, Q. Zhu, B. Hou, J. Zhu, X. Ma, and Y. Hao. “Influence of the oxygen in Hot-Carrier-Stress-Induced degradation in AlGaN/GaN high electron mobility transistors.” The 1st Workshop on Wide Bandgap Power Devices and Applications in Asia, 2018. (9) L. Chen, X. Ma, J. Zhu, B. Hou, M. Zhang, L. Yang, and Y. Hao. “Direct observation of gate leakage paths in AlGaN/GaN HEMTs by EBIC.” The 12th International Conference on Nitride Semiconductors (ICNS), 2017. (10) J. Zhu, L. Chen, J. Jiang, X. Lu, L. Yang, B. Hou, M. Liao, Y. Zhou, X. Ma, Y. Hao, “Ferroelectric Gate AlGaN/GaN E-Mode HEMTs With High Transport and Sub-Threshold Performance.” IEEE Electron Device Letters, 2018, 39(1):79-82.
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